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Proceedings Paper

Thermal effects on Co/Mo2C multilayer mirrors studied by soft x-ray standing wave enhanced photoemission spectroscopy
Author(s): A. Giglia; S. Mukherjee; N. Mahne; S. Nannarone; P. Jonnard; K. Le Guen; Y.-Y. Yuan; J.-M. André; Z.-S. Wang; H.-C. Li; J.-T. Zhu
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Paper Abstract

Here is presented the spectroscopic study of the evolution of the first buried interfaces of a B4C capped Co/Mo2C multilayer mirror induced by thermal treatment up to 600°C. This kind of study is typically performed to simulate the response of multilayer optics working in extreme conditions, as for instance when irradiated by new high brilliance sources as Free Electron Lasers. In fact, the efficiency of multilayers is related to the optical contrast between the alternating high and low density layers, and then to the degree of interdiffusion and the creation or evolution of interface compounds. The analysis has been performed at the Co L23 edge with different soft x-ray spectroscopic techniques including diffuse and specular reflectivity, total electron and fluorescent yield at the BEAR beamline at Elettra (Trieste) (http://www.elettra.trieste.it/elettra-beamlines/bear.html). The presentation is focused on the spectroscopic results obtained by soft x-ray standing wave enhanced photoemission (XSW) from the Mo 3d, B 1s, C 1s, O 1s core levels by using a photon energy close to the Co L23 edge and corresponding to the first Bragg peak of the multilayer. The experimental results have been compared with simulations to obtain information both on the chemical state (e.g. oxidation state) and interface morphology in terms of profiles of distribution of elements and interdiffusion of B, oxidized B and C in the interface region. In summary, it is possible to conclude in favour of a good stability of the multilayer in the investigated temperature range, as confirmed by the good performance in terms of reflectivity. These results confirm the usefulness of XSW for this kind analysis of multilayer optics.

Paper Details

Date Published: 3 May 2013
PDF: 10 pages
Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 87770I (3 May 2013); doi: 10.1117/12.2017252
Show Author Affiliations
A. Giglia, Lab. Nazionale TASC, CNR, Istituto Officina dei Materiali (Italy)
S. Mukherjee, Lab. Nazionale TASC, CNR, Istituto Officina dei Materiali (Italy)
N. Mahne, Sincrotrone Trieste S.C.p.A. (Italy)
S. Nannarone, Lab. Nazionale TASC, CNR, Istituto Officina dei Materiali (Italy)
Univ. degli Studi di Modena e Reggio Emilia (Italy)
P. Jonnard, Lab. de Chimie Physique-Matière et Rayonnement, CNRS, Univ. Pierre et Marie Curie (France)
K. Le Guen, Lab. de Chimie Physique-Matière et Rayonnement, CNRS, Univ. Pierre et Marie Curie (France)
Y.-Y. Yuan, Lab. de Chimie Physique-Matière et Rayonnement, CNRS, Univ. Pierre et Marie Curie (France)
J.-M. André, Lab. de Chimie Physique-Matière et Rayonnement, CNRS, Univ. Pierre et Marie Curie (France)
Z.-S. Wang, Tongji Univ. (China)
H.-C. Li, Tongji Univ. (China)
J.-T. Zhu, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 8777:
Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
Libor Juha; René Hudec; Ladislav Pina; Saša Bajt; Richard London, Editor(s)

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