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Proceedings Paper

Development of radiation-cooled slotted rotating target x-ray source (III)
Author(s): Motomu Asano; Takashi Tagawa; Hideshi Yoshikawa; Shuzo Hattori
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Paper Abstract

The design concept on X-ray lithography system using the X-ray source with an ebeam excited rotating target has been presented in the previous reportsl The X-ray source is developed to fit the laboratory and test productive use for the microlithography applied to O.25iim feature size. The e-beam focus diameter of 3mm at the power of 3kW to generate characteristic X-ray of 4.4A(Pd:Lc) wave length has been recently obtained, though it is not satisfactory as compared with the desired value of 1mm at the power of 10kW. The fundamental data for this experiment such as the vibration severity with the rotation of cooling fins, the temperature rise of the target and the maximum voltage of e-beam without a discharge are discussed. These show that the system will satisfy a stable structure and cooling capacity enough to step up the e-beam power and to reduce the spot size of e-beam.

Paper Details

Date Published: 1 May 1990
PDF: 7 pages
Proc. SPIE 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX, (1 May 1990); doi: 10.1117/12.20172
Show Author Affiliations
Motomu Asano, Meitec Corp. (Japan)
Takashi Tagawa, Meitec Corp. (Japan)
Hideshi Yoshikawa, ULVAC Corp. (Japan)
Shuzo Hattori, Meitec Corp. (Japan)


Published in SPIE Proceedings Vol. 1263:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX
Douglas J. Resnick, Editor(s)

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