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Proceedings Paper

Characterisation of EUV damage thresholds and imaging performance of Mo/Si multilayer mirrors
Author(s): Matthias Müller; Frank Barkusky; Torsten Feigl; Klaus Mann
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Paper Abstract

We studied 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. The experiments were performed on different types of Mo/Si mirrors, showing no significant difference in single pulse damage thresholds. However, the damage threshold for ten pulses is ≈ 60 % lower than the single pulse threshold, implying a defect dominated damage process. Using Nomarski (DIC) and atomic force microscopy (AFM) we analysed the damage morphologies, indicating a primarily thermally induced damage mechanism. Furthermore, we studied the radiationinduced change of reflectivity upon damage of a multilayer mirror. Additionally, we characterised transmission and reflection properties of novel Mo/Si multilayer beam splitters performing wavefront measurements with a Hartmann sensor at 13.5 nm wavelength. Such wavefront measurements allow also actinic investigations of thermal lens effects on EUV optics.

Paper Details

Date Published: 3 May 2013
PDF: 10 pages
Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 877705 (3 May 2013); doi: 10.1117/12.2016980
Show Author Affiliations
Matthias Müller, Laser-Lab. Göttingen e.V. (Germany)
Frank Barkusky, KLA-Tencor Corp. (United States)
Torsten Feigl, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Klaus Mann, Laser-Lab. Göttingen e.V. (Germany)


Published in SPIE Proceedings Vol. 8777:
Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
Libor Juha; René Hudec; Ladislav Pina; Saša Bajt; Richard London, Editor(s)

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