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Proceedings Paper

Investigation of EUV pellicle feasibility
Author(s): Luigi Scaccabarozzi; Dan Smith; Pedro Rizo Diago; Eric Casimiri; Nina Dziomkina; Henk Meijer
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Paper Abstract

EUV defectivity has been an important topic of investigation in past years. Today, the absence of a pellicle raises concerns for particle adders on reticle front side. A desire to improve defectivity on reticle front side via implementation of a pellicle could greatly assist in propelling EUV into high volume manufacturing. In this paper, we investigate a set of pellicle requirements and potential EUV pellicle materials. Further, we present experimental results of pellicle performance results and imaging results.

Paper Details

Date Published: 1 April 2013
PDF: 12 pages
Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867904 (1 April 2013); doi: 10.1117/12.2015833
Show Author Affiliations
Luigi Scaccabarozzi, ASML Netherlands B.V. (Netherlands)
Dan Smith, ASML Netherlands B.V. (Netherlands)
Pedro Rizo Diago, ASML Netherlands B.V. (Netherlands)
Eric Casimiri, ASML Netherlands B.V. (Netherlands)
Nina Dziomkina, ASML Netherlands B.V. (Netherlands)
Henk Meijer, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

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