Share Email Print
cover

Proceedings Paper

Lifetime and refurbishment of multilayer LPP collector mirrors
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The usable power of high-power EUV light sources at 13.5 nm and also the lifetime of source and collector optics are currently considered to be the largest challenges encountered during the transition of EUV lithography from the current beta-tool status to high-volume manufacturing. Fraunhofer IOF Jena has developed cost-effective refurbishment technologies of multilayer-based near normal incidence collector mirrors for high-power laser-produced plasma sources. Presently, the collector mirror lifetime exceeds 80 billion laser pulses which correspond to a lifetime of several months during continuous use of the source. Together with their partners Cymer is currently carrying out a focused program to improve the collector lifetime. New multilayer coatings together with new in-situ cleaning strategies during source operation are key technology development strategies to get closer to the ultimate target of about one year collector lifetime. The paper discusses different LPP collector refurbishment strategies and presents the recent status on collector refurbishment techniques.

Paper Details

Date Published: 1 April 2013
PDF: 9 pages
Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86790C (1 April 2013); doi: 10.1117/12.2015492
Show Author Affiliations
Torsten Feigl, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Marco Perske, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Hagen Pauer, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Tobias Fiedler, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Sergiy Yulin, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Andreas Tünnermann, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Norbert R. Böwering, Cymer, Inc. (United States)
Alex I. Ershov, Cymer, Inc. (United States)
Silvia de Dea, Cymer, Inc. (United States)
Kay Hoffmann, Cymer, Inc. (United States)
Bruno La Fontaine, Cymer, Inc. (United States)
Igor V. Fomenkov, Cymer, Inc. (United States)
David C. Brandt, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

© SPIE. Terms of Use
Back to Top