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Proceedings Paper

Target x-ray source lithography and photolithography mixed and match system
Author(s): Shuzo Hattori; Shinzo Morita; Akihiro Yoshida; Tsutomu Nomura; Takashi Tagawa; Hideshi Yoshikawa
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Paper Abstract

Target X-ray source lithography and photo lithography mixed and match system was proposed for an effective lithography system. The key technology for the system is a projection moire alignment, whose marks are used for both photo and X-ray lithography. In order to realize the systeimi, related technologies and apparatus are developing, which are photo and X-ray stepper, Xray source of radiation cooled slotted Pd target, X-ray mask and X-ray mask inspection system.

Paper Details

Date Published: 1 May 1990
PDF: 6 pages
Proc. SPIE 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX, (1 May 1990); doi: 10.1117/12.20150
Show Author Affiliations
Shuzo Hattori, Nagoya Industrial Science Research Institute (Japan)
Shinzo Morita, Nagoya Univ. (Japan)
Akihiro Yoshida, Toyoda Automatic Loom Works, Ltd. (Japan)
Tsutomu Nomura, Nippon Seiko K.K. (Japan)
Takashi Tagawa, Meitec Co. (Japan)
Hideshi Yoshikawa, ULVAC Co. (Japan)


Published in SPIE Proceedings Vol. 1263:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX
Douglas J. Resnick, Editor(s)

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