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Proceedings Paper

Long range metrological atomic force microscope with versatile measuring head
Author(s): Mingzhen Lu; Sitian Gao; Qi Li; Wei Li; Yushu Shi; Xingfu Tao
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Paper Abstract

A long range metrological atomic force microscope (AFM) has been developed at NIM. It aims to realize a maximum measurement volume of 50mm×50mm×2mm with an uncertainty of a few tens of nanometers in the whole range. In compliance with Abbe Principle, the instrument is designed as a sample-scanning type. The sample is moved by a 6-DOF piezostage in combination with a hybrid slide-air bearing stage for long scanning range. Homodyne interferometers with four passes attached to a metrological frame measure relative displacement between the probe and sample thus the instrument is directly traceable to the SI. An AFM head is developed as the measuring head for the instrument. Considering accuracy and dynamic performance of the instrument, it is designed to be capable of scanning perpendicularly in a range of 5μm×5μm×5μm with a 3-DOF piezostage. Optical beam deflection method is used and a minimum of components are mounted on the moving part. A novel design is devised so that the photodetector is only sensitive to the deflection of cantilever, but not the displacement of the head. Moving manner of the head varies with scanning range and mode of the instrument. Results of different measurements are demonstrated, showing the excellent performance of the instrument.

Paper Details

Date Published: 31 January 2013
PDF: 9 pages
Proc. SPIE 8759, Eighth International Symposium on Precision Engineering Measurement and Instrumentation, 87594Y (31 January 2013); doi: 10.1117/12.2014870
Show Author Affiliations
Mingzhen Lu, National Institute of Metrology (China)
Sitian Gao, National Institute of Metrology (China)
Qi Li, National Institute of Metrology (China)
Wei Li, National Institute of Metrology (China)
Yushu Shi, National Institute of Metrology (China)
Xingfu Tao, National Institute of Metrology (China)


Published in SPIE Proceedings Vol. 8759:
Eighth International Symposium on Precision Engineering Measurement and Instrumentation
Jie Lin, Editor(s)

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