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Proceedings Paper

Segmental calibration for commercial AFM in vertical direction
Author(s): Yushu Shi; Sitian Gao; Mingzhen Lu; Wei Li; Xuefang Xu
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Paper Abstract

Atomic force microscopy (AFM) is most widely applied in scientific research and industrial production. AFM is a scanning probe imaging and measuring device, useful for physical and chemical studies. Depends on its basic structure, microscopic surface pattern can be measured and captured by mechanically scanning. Its vertical and horizon resolution can reach to 0.01nm and 0.1nm. Commonly the measurement values of commercial AFM are directly from scanning piezoelectric tube, so that it not a traceable value. In order to solve the problem of commercial AFM’s traceability, step height standard references are applied to calibrate the piezoelectric ceramic housing in scanning tube. All of the serial of step height standard references, covering the commercial AFM vertical scale, are calibrated by Metrology AFM developed by National Institute of Metrology (NIM), China. Three interferometers have been assembled in its XYZ axis, therefore the measurement value can directly trace to laser wavelength. Because of nonlinear characteristic of PZT, the method of segmental calibration is proposed. The measurement scale can be divided into several subsections corresponding to the calibrated values of the series of step height standards references. By this method the accuracy of measurements can be ensured in each segment measurement scale and the calibration level of the whole instrument can be promoted. In order to get a standard step shape by commercial AFM, substrate removal method is applied to deal with the bow shape problem.

Paper Details

Date Published: 31 January 2013
PDF: 7 pages
Proc. SPIE 8759, Eighth International Symposium on Precision Engineering Measurement and Instrumentation, 87594E (31 January 2013); doi: 10.1117/12.2014859
Show Author Affiliations
Yushu Shi, National Institute of Metrology (China)
Sitian Gao, National Institute of Metrology (China)
Mingzhen Lu, National Institute of Metrology (China)
Wei Li, National Institute of Metrology (China)
Xuefang Xu, Hefei Univ. of Technology (China)


Published in SPIE Proceedings Vol. 8759:
Eighth International Symposium on Precision Engineering Measurement and Instrumentation
Jie Lin, Editor(s)

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