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Proceedings Paper

KeV ion-beam-exposed PMIPK and PPIPK
Author(s): Wen-An Loong; Nien-tsu Peng
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Paper Abstract

The exposure characteristics of polymethyl isopropenylketone(PMIPK) and polyphenyl - isopropenylketone(PPIPK) exposed to 40 and 80 KeV H+ and B+ ion-beam have been studied. It is believed that the electron rich phenyl group in PPIPK has increased stopping power to bigger B ion, but not to smaller H+ ion. Linear relationship is found with simulation parameter A as a function of exposure dose (KeV x ion fluence) for specific ion and polymer within the used energy range. Gel permeation chromatography also indicates that the main chain scissioning of PMIPK is faster than that of PPIPK when they are exposed to B+ under same exposure conditions.

Paper Details

Date Published: 1 May 1990
PDF: 6 pages
Proc. SPIE 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX, (1 May 1990); doi: 10.1117/12.20146
Show Author Affiliations
Wen-An Loong, National Chiao Tung Univ. (Taiwan)
Nien-tsu Peng, National Chiao Tung Univ. (Taiwan)


Published in SPIE Proceedings Vol. 1263:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX
Douglas J. Resnick, Editor(s)

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