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NIL Template : progress and challenges
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Paper Details

Date Published:
Proc. SPIE 8680, Alternative Lithographic Technologies V, 868003; doi: 10.1117/12.2014445
Show Author Affiliations
Naoya Hayashi, Dai Nippon Printing (Japan)
Douglas J. Resnick, Molecular Imprints Inc (United States)

Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)

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