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Proceedings Paper

Iterative learning control for dual stroke actuator systems
Author(s): Xiaoming Jiang; Yan Wang; Xin Li; Yang Liu; Xinglin Chen
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Paper Abstract

This paper presents a dual iterative learning control strategy for a dual stroke actuator system in the lithography scanner. The motion control strategy is employed, in which the trajectory of a short stroke stage is followed by one of a long stroke stage. A short stroke stage is used for improving the system response performance while a long stroke stage is introduced for the purpose of long motion stroke of the system. Combining the dynamic model of the system, the coupling effects between two actuators are analyzed, and the system model is simplified. This model is used for the design of a dual iterative learning control strategy and decoupling controllers. As a result, the heavy proportion of the recurrent coupling force on the long stroke stage is eliminated by the decoupling feedforward action from the output of the short stroke stage in the scanning process. The rest of the coupling force is removed by the first iterative learning control between two subsystems. The impact on the short stroke stage from the long stroke stage is weakened, and the short stroke stage is then designed independently by the two degree of freedom control strategy combining feedback control with the second iterative learning control. The convergence of the iterative learning control system is shown, and the effectiveness of the combined method is verified by a simulated wafer stage.

Paper Details

Date Published: 31 January 2013
PDF: 8 pages
Proc. SPIE 8759, Eighth International Symposium on Precision Engineering Measurement and Instrumentation, 87592I (31 January 2013); doi: 10.1117/12.2014437
Show Author Affiliations
Xiaoming Jiang, Harbin Institute of Technology (China)
Yan Wang, Harbin Institute of Technology (China)
Xin Li, Harbin Institute of Technology (China)
Yang Liu, Harbin Institute of Technology (China)
Xinglin Chen, Harbin Institute of Technology (China)


Published in SPIE Proceedings Vol. 8759:
Eighth International Symposium on Precision Engineering Measurement and Instrumentation
Jie Lin, Editor(s)

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