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Proceedings Paper

A study on the automation of scanner matching
Author(s): Yuan He; Alexander Serebryakov; Scott Light; Vivek Jain; Erik Byers; Ronald Goossens; Zhi-Yuan Niu; Peter Engblom; Scott Larson; Bernd Geh; Craig Hickman; Hoyoung Kang
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Paper Abstract

Scanner matching based on CD or patterning contours has been demonstrated in past works. All of these published works require extensive wafer metrology. In contrast, this work extends a previously proposed optical pattern matching method that requires little metrology by adding the component requirements and the procedure for creating an automation flow. In a test case, we matched an ASML XT:1900i using a DOE to an ASML NXT:1950i scanner using FlexRay. The matching was conducted on a 4x nm process test layer as a development vehicle for the 2x nm product nodes. The paper summarizes the before and after matching data and analysis, with future opportunities for improvements suggested.

Paper Details

Date Published: 12 April 2013
PDF: 11 pages
Proc. SPIE 8683, Optical Microlithography XXVI, 86830W (12 April 2013); doi: 10.1117/12.2014402
Show Author Affiliations
Yuan He, Micron Technology, Inc. (United States)
Alexander Serebryakov, ASML US, Inc. (United States)
Scott Light, Micron Technology, Inc. (United States)
Vivek Jain, ASML US, Inc. (United States)
Erik Byers, Micron Technology, Inc. (United States)
Ronald Goossens, ASML US, Inc. (United States)
Zhi-Yuan Niu, ASML US, Inc. (United States)
Peter Engblom, ASML US, Inc. (United States)
Scott Larson, ASML US, Inc. (United States)
Bernd Geh, Carl Zeiss SMT Inc. (United States)
Craig Hickman, Micron Technology, Inc. (United States)
Hoyoung Kang, Micron Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 8683:
Optical Microlithography XXVI
Will Conley, Editor(s)

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