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Proceedings Paper

Focused ion-beam modification and patterning of high-Tc superconductors
Author(s): Lloyd R. Harriott; P. A. Polakos; C. E. Rice; Peter L. Gammel; William P. Robinson; Hugh C. Hiner
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Paper Abstract

High-resolution patterning of thin-film high temperature superconductors is necessary in the development of device applications of these new materials. Such fine-line structures are necessary in the fabrication of devices such as superconducting quantum interference devices (SQUIDs), transmission lines and others. Furthermore, high spatial resolution patterning can be an important tool in studying the fundamental properties of the films themselves. Focused ion beam patterning has recently been applied to YBaCuO thin films. The finely focused ion beam can produce patterns by local physical sputtering or through implant damage. These techniques have proven to be valuable for producing submicron superconducting structures in a reliable way. This paper describes the method of modification and patterning of high T thin films by focused ion beam implantation damage. For low ion doses, the film properties such as critical current and transition temperature are reduced monotonically with dose. At higher doses, the material is rendered non-superconducting locally. We show that micron-sized superconducting structures can be fabricated by this very simple one-step technique at ion doses in the range of 1012 to iO"1 ions/cm2 with a 300 keY Si beam.

Paper Details

Date Published: 1 May 1990
PDF: 9 pages
Proc. SPIE 1263, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX, (1 May 1990); doi: 10.1117/12.20144
Show Author Affiliations
Lloyd R. Harriott, AT&T Bell Labs. (United States)
P. A. Polakos, AT&T Bell Labs. (United States)
C. E. Rice, AT&T Bell Labs. (United States)
Peter L. Gammel, AT&T Bell Labs. (United States)
William P. Robinson, MicroBeam Inc. (United States)
Hugh C. Hiner, MicroBeam Inc. (United States)

Published in SPIE Proceedings Vol. 1263:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX
Douglas J. Resnick, Editor(s)

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