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Proceedings Paper

Design-based metrology for development and manufacturing applications
Author(s): Peter Brooker; Michael Lee; Ezequiel Vidal Russel; Shimon Levi; Sylvain Berthiaume; William A. Stanton; Travis Brist
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Paper Abstract

This work presents how the combination of EDA and CDSEM tools enable development and manufacturing engineers to collect CDSEM data of a large diversity of features and contexts seamlessly for OPC model calibration and validation, process development, and inline manufacturing monitoring. We will present the application and results of a solution proposed in a previously published paper[1] and then review the benefits of enabling development and manufacturing engineers to make metrology-related decisions within their environments. Finally, new applications for automated CDSEM recipe generation and data collection will be discussed.

Paper Details

Date Published: 18 April 2013
PDF: 10 pages
Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 868123 (18 April 2013); doi: 10.1117/12.2014182
Show Author Affiliations
Peter Brooker, Synopsys, Inc. (United States)
Michael Lee, Micron Technology, Inc. (United States)
Ezequiel Vidal Russel, Micron Technology, Inc. (United States)
Shimon Levi, Applied Materials (Israel)
Sylvain Berthiaume, Synopsys, Inc. (Canada)
William A. Stanton, Synopsys, Inc. (United States)
Travis Brist, Synopsys, Inc. (United States)


Published in SPIE Proceedings Vol. 8681:
Metrology, Inspection, and Process Control for Microlithography XXVII
Alexander Starikov; Jason P. Cain, Editor(s)

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