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Proceedings Paper

Imaging capability and lithographic characterization on 0.9-sigma SEMATECH Albany MET
Author(s): Yu-Jen Fan; Chandra Sarma; Erik Sohmen; Scott Wright; Mark Neisser; Dominic Ashworth
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Paper Details

Date Published:
Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86792P; doi: 10.1117/12.2013825
Show Author Affiliations
Yu-Jen Fan, SEMATECH North (United States)
Chandra Sarma, SEMATECH North (United States)
Erik Sohmen, Carl Zeiss SMT (Germany)
Scott Wright, SEMATECH North (United States)
Mark Neisser, SEMATECH North (United States)
Dominic Ashworth, SEMATECH North (United States)

Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

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