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Proceedings Paper

Compatibility of optimized source over design changes in the foundry environment
Author(s): Jojo Pei; Feng Shao; Omar ElSewefy; Cynthia Zhu; Verne Xu; Yu Zhu; Liguo Zhang; Xuelong Shi; Qingwei Liu; Aasutosh Dave
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Paper Abstract

It is evident that as industry moves towards 28 and 20 nm large scale production, more flexibility in source is eminent for better process margin. In this paper, we review different realms of illumination optimization techniques with combinations of currently available source shapes along with pixelated source optimization. However, it has been observed in the past that any optimized source heavily relies on the patterns that are used in optimization. Therefore, it is critical that early in the resolution enhancement technology (RET) selection flow, test patterns are carefully chosen. The patterns should maintain the balance of cycle time for source tuning and at the same time ensure fidelity in accuracy. This type of trade-off becomes easier with an automated pattern selection tool that can guarantee coverage and accuracy together. Different approaches of pattern selection are demonstrated in this paper and the knowledge is transferred to development activities for 28 nm layers. In this paper we investigate compatibility of sources that are tuned over a set of design database and its adaptability of optimized source over small variations in design. At the end we demonstrate a reliable solution that could be integrated early in RET development and easily adapted for the production environment.

Paper Details

Date Published: 12 April 2013
PDF: 8 pages
Proc. SPIE 8683, Optical Microlithography XXVI, 86831M (12 April 2013); doi: 10.1117/12.2013704
Show Author Affiliations
Jojo Pei, Semiconductor Manufacturing International Corp. (China)
Feng Shao, Mentor Graphics Corp. (United States)
Omar ElSewefy, Mentor Graphics Corp. (United States)
Cynthia Zhu, Mentor Graphics Corp. (United States)
Verne Xu, Semiconductor Manufacturing International Corp. (China)
Yu Zhu, Mentor Graphics Corp. (United States)
Liguo Zhang, Mentor Graphics Corp. (United States)
Xuelong Shi, Semiconductor Manufacturing International Corp. (China)
Qingwei Liu, Semiconductor Manufacturing International Corp. (China)
Aasutosh Dave, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 8683:
Optical Microlithography XXVI
Will Conley, Editor(s)

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