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Proceedings Paper

Photoluminescence metrology for LED characterization in high volume manufacturing
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Paper Abstract

In this paper we will review typical applications of photoluminescence (PL) metrology in high volume LED manufacturing environments. PL is a well-established method for analysis of semiconductor properties. The technique is non-contact, non-destructive and rapid. We will describe the principles of the measurement and review PL data from LED process wafers. We will discuss how PL measurement results like peak wavelength, dominant wavelength and PL intensity are obtained. We will summarize the accuracy, precision, stability and other considerations of the measurement. Finally, metrology considerations for manufacturing LEDs on large diameter substrates, including the possibility of 8” silicon substrates, will be presented.

Paper Details

Date Published: 10 April 2013
PDF: 8 pages
Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86810P (10 April 2013); doi: 10.1117/12.2013624
Show Author Affiliations
Christopher J. Raymond, Nanometrics Inc. (United States)
Zhiqiang Li, Nanometrics Inc. (United States)


Published in SPIE Proceedings Vol. 8681:
Metrology, Inspection, and Process Control for Microlithography XXVII
Alexander Starikov; Jason P. Cain, Editor(s)

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