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Proceedings Paper

Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5
Author(s): Holger Glatzel; Dominic Ashworth; Mark Bremer; Rodney Chin; Kevin Cummings; Luc Girard; Michael Goldstein; Eric Gullikson; Russ Hudyma; Jim Kennon; Bob Kestner; Lou Marchetti; Patrick Naulleau; Regina Soufli; Eberhard Spiller
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Paper Abstract

In support of the Extreme Ultraviolet Lithography (EUVL) roadmap, a SEMATECH/CNSE joint program is under way to develop 13.5 mn R and D photolithography tools with small fields (micro-field exposure tools [METs]) and numerical apertures (NAs) of 0.5. The transmitted wavefront error of the two-mirror optical projection module (projection optics box [FOB]) is specified to less than 1 mn root mean square (RMS) over its 30 μm x 200 μm image field. Not accounting for scatter and flare losses, its Strehl ratio computes to 82%. Previously reported lithography modeling on this system [1] predicted a resolution of 11 mn with a k-factor of 0.41 and a resolution of 8 mn with extreme dipole illumination. The FOB's magnification (5X), track length, and mechanical interfaces match the currently installed 0.3 NA FOBs [2] [3] [6], so that significant changes to the current tool platforms and other adjacent modules will not be necessary. The distance between the reticle stage and the secondary mirror had to be significantly increased to make space available for the upgraded 0.5 NA illumination modules [1].

Paper Details

Date Published: 1 April 2013
PDF: 16 pages
Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867917 (1 April 2013); doi: 10.1117/12.2012698
Show Author Affiliations
Holger Glatzel, Zygo Corp. (United States)
Dominic Ashworth, SEMATECH Inc. (United States)
Mark Bremer, Zygo Corp. (United States)
Rodney Chin, Zygo Corp. (United States)
Kevin Cummings, SEMATECH Inc. (United States)
Luc Girard, Zygo Corp. (United States)
Michael Goldstein, SEMATECH Inc. (United States)
Eric Gullikson, Lawrence Berkeley National Lab. (United States)
Russ Hudyma, Hyperion Development LLC (United States)
Jim Kennon, Zygo Corp. (United States)
Bob Kestner, Zygo Corp. (United States)
Lou Marchetti, Zygo Corp. (United States)
Patrick Naulleau, Lawrence Berkeley National Lab. (United States)
Regina Soufli, Lawrence Livermore National Lab. (United States)
Eberhard Spiller, Spiller X-Ray Optics (United States)


Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

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