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Proceedings Paper

Hybrid approach to optical CD metrology of directed self-assembly lithography
Author(s): Stephane Godny; Masafumi Asano; Akiko Kawamoto; Koichi Wakamoto; Kazuto Matsuki; Cornel Bozdog; Matthew Sendelbach; Igor Turovets; Ronen Urenski; Renan Milo
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Paper Abstract

Directed Self Assembly (DSA) for contact layers is a challenging process in need of reliable metrology for tight process control. Key parameters of interest are guide CD, polymer CD, and residual polymer thickness at the bottom of the guide cavity. We show that Optical CD (OCD) provides the needed performance for DSA contact metrology. The measurement, done with a multi-channel spectroscopic reflectometry (SR) system, is enhanced through elements of a Holistic Metrology approach such as Injection and Hybrid Metrology.

Paper Details

Date Published: 10 April 2013
PDF: 8 pages
Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86812D (10 April 2013); doi: 10.1117/12.2012660
Show Author Affiliations
Stephane Godny, Nova Measuring Instruments Ltd. (Israel)
Masafumi Asano, Toshiba Corp. (Japan)
Akiko Kawamoto, Toshiba Corp. (Japan)
Koichi Wakamoto, Nova Measuring Instruments K.K. (Japan)
Kazuto Matsuki, Toshiba Corp. (Japan)
Cornel Bozdog, Nova Measuring Instruments Inc. (United States)
Matthew Sendelbach, Nova Measuring Instruments Inc. (United States)
Igor Turovets, Nova Measuring Instruments Ltd. (Israel)
Ronen Urenski, Nova Measuring Instruments Ltd. (Israel)
Renan Milo, Nova Measuring Instruments Ltd. (Israel)


Published in SPIE Proceedings Vol. 8681:
Metrology, Inspection, and Process Control for Microlithography XXVII
Alexander Starikov; Jason P. Cain, Editor(s)

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