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Proceedings Paper

Orientation and position-controlled block copolymer nanolithography for bit-patterned media
Author(s): R. Yamamoto; M. Kanamaru; K. Sugawara; N. Sasao; Y. Ootera; T. Okino; H. Hieda; N. Kihara; Y. Kamata; A. Kikitsu
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Paper Abstract

Bit-patterned media (BPM) is a candidate for high-density magnetic recording media. Directed self-assembly (DSA) is expected to be a solution for the fabrication process of high-density BPM. A BPM with 20 nm-pitch dot pattern is fabricated. A 100 nm-pitch triangle lattice dot pattern, which is fabricated by EB lithography, is used as a guide post to order PS-PDMS self-assembled diblock co-polymer with 20 nm pitch. Dot-pitch fluctuation and linearity of pseudo dot tracks are estimated. The standard deviation of the dot-pitch variation including the post guide is 8% of the self-assembled dot pitch. The dot-position deviation is estimated to be about 8% of the pseudo dot track pitch. In both cases, variation of the size and pitch of the post guides is found to increase the dot-pitch fluctuation and dot-position deviation from pseudo dot-track.

Paper Details

Date Published: 26 March 2013
PDF: 6 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 86801U (26 March 2013); doi: 10.1117/12.2012654
Show Author Affiliations
R. Yamamoto, Toshiba Corp. R&D Ctr. (Japan)
M. Kanamaru, Toshiba Corp. R&D Ctr. (Japan)
K. Sugawara, Toshiba Corp. R&D Ctr. (Japan)
N. Sasao, Toshiba Corp. R&D Ctr. (Japan)
Y. Ootera, Toshiba Corp. R&D Ctr. (Japan)
T. Okino, Toshiba Corp. R&D Ctr. (Japan)
H. Hieda, Toshiba Corp. R&D Ctr. (Japan)
N. Kihara, Toshiba Corp. R&D Ctr. (Japan)
Y. Kamata, Toshiba Corp. R&D Ctr. (Japan)
A. Kikitsu, Toshiba Corp. R&D Ctr. (Japan)


Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)

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