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Proceedings Paper

Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers
Author(s): Ya-Mi Chuang; Han-Hao Cheng; Kevin Jack; Andrew Whittaker; Idriss Blakey
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Paper Abstract

Overcoming the resolution-LER-sensitivity trade-off is a key challenge for the development of novel resists and processes that are able to achieve the ITRS targets for future lithography nodes. Here, we describe a process that treats lithographic patterns with aqueous solutions of block copolymers to facilitate a reduction in LER. A detailed understanding of parameters affecting adhesion and smoothing is gained by first investigating the behavior of the polymers on planar smooth and rough surfaces. Once healing was established in these model systems the methodology is tested on lithographically printed features where significant healing is observed, making this a promising technology for LER remediation.

Paper Details

Date Published: 26 March 2013
PDF: 10 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 868009 (26 March 2013); doi: 10.1117/12.2012488
Show Author Affiliations
Ya-Mi Chuang, The Univ. of Queensland (Australia)
Han-Hao Cheng, Australian National Fabrication Facility (Australia)
Kevin Jack, The Univ. of Queensland (Australia)
Andrew Whittaker, The Univ. of Queensland (Australia)
Idriss Blakey, The Univ. of Queensland (Australia)


Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)

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