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Proceedings Paper

Three-dimensional phase defect inspection of EUV masks using the TSOM method
Author(s): Ravikiran Attota; Vibhu Jindal; Haesung Park; Lisa Bendall
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Paper Details

Date Published:
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Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86790S; doi: 10.1117/12.2012456
Show Author Affiliations
Ravikiran Attota, National Institute of Standards and Technology (United States)
Vibhu Jindal, SEMATECH North (United States)
Haesung Park, National Institute of Standards and Technology (United States)
Lisa Bendall, Brigham Young University (United States)


Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

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