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Proceedings Paper

Analysis of acid-generating action of PAG in an EUV resist using acid-sensitive dyes
Author(s): Atsushi Sekiguchi; Yoko Matsumoto; John J. Biafore
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Paper Abstract

Researchers are currently examining various methods for determining the quantity of acid generated by a photoacid generator (PAG) and for analyzing acid-generating reactions using acid-sensitive dyes that react with acid and generate a color. Adding an acid-sensitive dye to the resist gives a clear grasp of the acid-generating action. The process involves applying a resist containing an acid-sensitive dye to a quartz substrate; exposing the substrate; and measuring and evaluating the absorbance of a chromogenic substance near 530 nm using a spectroscope. The method determines the rate constant for acid generation (Dill C parameter) during exposure based on the relationship between transmissivity at 530 nm and exposure dose. Using this method, we obtained and compared rate constants for acid generation (C parameters) as part of our study of dependence on the quantity of quencher in the EUV resist. Our results indicate a new model that accounts for the quencher concentration parameter would be useful in analyzing dependence on the quantity of quencher. This paper presents these findings, together with the results of studies of profile simulations using the quencher concentration parameter obtained in the experiments.

Paper Details

Date Published: 29 March 2013
PDF: 14 pages
Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 86821J (29 March 2013); doi: 10.1117/12.2012106
Show Author Affiliations
Atsushi Sekiguchi, Litho Tech Japan Co., Ltd. (Japan)
Yoko Matsumoto, Litho Tech Japan Co., Ltd. (Japan)
John J. Biafore, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 8682:
Advances in Resist Materials and Processing Technology XXX
Mark H. Somervell, Editor(s)

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