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Proceedings Paper

Process enhancements for negative tone development (NTD)
Author(s): Go Noya; Kazuma Yamamoto; Naoki Matsumoto; Yukie Takemura; Maki Ishii; Yoshihiro Miyamoto; Masahiro Ishii; Tatsuro Nagahara; Georg Pawlowski
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Paper Abstract

The negative tone development (NTD) process has proven benefits for superior imaging performance in 193nm lithography. Shrink materials, such as AZ® RELACS® have found widespread use as a resolution enhancement technology in conventional 248nm (DUV), 193 nm dry (ArF) and 193 nm immersion (ArFi) lithography. Surfactant rinses, such as AZ® FIRM® are employed as yield enhancement materials to improve the lithographic performance by avoiding pattern collapse, eliminating defects, and improving CDU. This paper describes the development and recent achievements obtained with new shrink and rinse materials for application in NTD patterning processes.

Paper Details

Date Published: 26 March 2013
PDF: 8 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 86802E (26 March 2013); doi: 10.1117/12.2012077
Show Author Affiliations
Go Noya, AZ Electronic Materials Manufacturing KK (Japan)
Kazuma Yamamoto, AZ Electronic Materials Manufacturing KK (Japan)
Naoki Matsumoto, AZ Electronic Materials Manufacturing KK (Japan)
Yukie Takemura, AZ Electronic Materials Manufacturing KK (Japan)
Maki Ishii, AZ Electronic Materials Manufacturing KK (Japan)
Yoshihiro Miyamoto, AZ Electronic Materials Manufacturing KK (Japan)
Masahiro Ishii, AZ Electronic Materials Manufacturing KK (Japan)
Tatsuro Nagahara, AZ Electronic Materials Manufacturing KK (Japan)
Georg Pawlowski, AZ Electronic Materials Manufacturing KK (Japan)


Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)

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