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Proceedings Paper

Assessment of out-of-band radation from EUV AD1 and investigation of spectral sensitivity resists in the DUV region
Author(s): Kyoungyoung Cho; Alexander Friz; Mark Neisser; Sang-In Han
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Paper Details

Date Published:
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Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867927; doi: 10.1117/12.2011794
Show Author Affiliations
Kyoungyoung Cho, SEMATECH North (United States)
Alexander Friz, SEMATECH North (United States)
Mark Neisser, SEMATECH North (United States)
Sang-In Han, ASML (United States)


Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

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