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Proceedings Paper

Pattern matching for identifying and resolving non-decomposition-friendly designs for double patterning technology (DPT)
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Paper Abstract

A pattern matching methodology that identifies non-decomposition-friendly designs and provides localized guidance for layout-fixing is presented for double patterning lithography. This methodology uses a library of patterns in which each pattern has been pre-characterized as impossible-to-decompose and annotated with a design rule for guiding the layout fixes. A pattern matching engine identifies these problematic patterns in design, which allows the layout designers to anticipate and prevent decomposition errors, prior to layout decomposition. The methodology has been demonstrated on a 180 um2 layout migrated from the previous 28nm technology node for the metal 1 layer. Using a small library of just 18 patterns, the pattern matching engine identified 119 out of 400 decomposition errors, which constituted coverage of 29.8%.

Paper Details

Date Published: 29 March 2013
PDF: 10 pages
Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, 868409 (29 March 2013); doi: 10.1117/12.2011690
Show Author Affiliations
Lynn T. -N. Wang, GLOBALFOUNDRIES Inc. (United States)
Vito Dai, GLOBALFOUNDRIES Inc. (United States)
Luigi Capodieci, GLOBALFOUNDRIES Inc. (United States)

Published in SPIE Proceedings Vol. 8684:
Design for Manufacturability through Design-Process Integration VII
Mark E. Mason; John L. Sturtevant, Editor(s)

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