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Proceedings Paper

Self-aligned double patterning friendly configuration for standard cell library considering placement impact
Author(s): Jhih-Rong Gao; Bei Yu; Ru Huang; David Z. Pan
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Paper Abstract

Self-aligned double patterning (SADP) has become a promising technique to push pattern resolution limit to sub-22nm technology node. Although SADP provides good overlay controllability, it encounters many challenges in physical design stages to obtain conflict-free layout decomposition. In this paper, we study the impact on placement by different standard cell layout decomposition strategies. We propose a SADP friendly standard cell configuration which provides pre-coloring results for standard cells. These configurations are brought into the placement stage to help ensure layout decomposability and save the extra effort for solving conflicts in later stages.

Paper Details

Date Published: 29 March 2013
PDF: 10 pages
Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, 868406 (29 March 2013); doi: 10.1117/12.2011660
Show Author Affiliations
Jhih-Rong Gao, The Univ. of Texas at Austin (United States)
Bei Yu, The Univ. of Texas at Austin (United States)
Ru Huang, Peking Univ. Shenzhen Graduate School (China)
David Z. Pan, The Univ. of Texas at Austin (United States)


Published in SPIE Proceedings Vol. 8684:
Design for Manufacturability through Design-Process Integration VII
Mark E. Mason; John L. Sturtevant, Editor(s)

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