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Proceedings Paper

Relation between sensitivity and resolution in polymer bound PAGs and polymer blend PAGs
Author(s): Satoshi Enomoto; Tuan Nguyen Dang; Cong Que Dinh; Seiichi Tagawa
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Paper Abstract

Recently, polymer-bound PAGs (anion bound) are actively investigated as Extreme ultra violet (EUV) resist. Some experimental results showed, in case of shot diffusion length acid generator bounded polymer showed lower sensitivity comparing with long diffusion length acid generator. In our previous investigation, short diffusion length PAG reactivity is changed due to binding to polymer by pulse radiolysis method. However, shot diffusion PAG bound to polymer showed lower LWR than long diffusion length PAG. Therefore, acid diffusion length difference originate in PAG is important to resist performance. The diffusion length difference influence deprotection reaction in PEB process. In this paper, we evaluated polymer-bound PAGs and polymer blend PAGs by electron beam (EB) exposure tool employing various PEB temperature and PEB time to conform the influence of acid diffusion regulation about polymer-bound PAGs for resist performances. As the result, even if acid generator bound polymer applied as a resist, acid diffusion regulation isn’t so strict that acid can migrate in the polymer matrix during PEB.

Paper Details

Date Published: 1 April 2013
PDF: 6 pages
Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867926 (1 April 2013); doi: 10.1117/12.2011650
Show Author Affiliations
Satoshi Enomoto, Osaka Univ. (Japan)
Japan Science and Technology Agency (Japan)
Tuan Nguyen Dang, Osaka Univ. (Japan)
Japan Science and Technology Agency (Japan)
Cong Que Dinh, Osaka Univ. (Japan)
Japan Science and Technology Agency (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)
Japan Science and Technology Agency (Japan)


Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

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