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Proceedings Paper

Perpendicular orientation of block-co-polymer on controlled neutralization layer
Author(s): Daiju Shiono; Tsuyoshi Kurosawa; Kenichiro Miyashita; Tasuku Matsumiya; Ken Miyagi; Katsumi Ohmori
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Paper Abstract

We have prepared and analyzed neutralization layer material to perform perpendicular morphology of Poly (styrene-block-methyl methacrylate) (PS-b-PMMA) as Block-Co-Polymers (BCPs). Neutralization layer surface property is optimized by changing hydrophilicity. We have evaluated two types of neutralization layer material. First one is graft type polymer which makes chemical bonding to substrate. The other is crosslink type polymer which becomes insoluble to organic solvent by thermal crosslink reaction. We checked neutralization function by changing film thickness of the neutralization layer under PS-b-PMMA. Regarding to graft type, it was found that when the film thickness of neutralization layer is over 2.3 nm, PS-b-PMMA forms perpendicular morphology on appropriate neutralization layer. Similarly, regarding to crosslink type, it was found that when the film thickness of neutralization layer is over 1.9 nm, PS-b-PMMA forms perpendicular morphology on appropriate neutralization layer. Finally, we will show lamella and cylinder patterns changing L0 of PS-b-PMMA on neutralization layer.

Paper Details

Date Published: 26 March 2013
PDF: 7 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 86801Q (26 March 2013); doi: 10.1117/12.2011638
Show Author Affiliations
Daiju Shiono, Tokyo Ohka Kogyo Co. Ltd. (Japan)
Tsuyoshi Kurosawa, Tokyo Ohka Kogyo Co. Ltd. (Japan)
Kenichiro Miyashita, Tokyo Ohka Kogyo Co. Ltd. (Japan)
Tasuku Matsumiya, Tokyo Ohka Kogyo Co. Ltd. (Japan)
Ken Miyagi, Tokyo Ohka Kogyo Co. Ltd. (Japan)
Katsumi Ohmori, Tokyo Ohka Kogyo Co. Ltd. (Japan)


Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)

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