Share Email Print
cover

Proceedings Paper

Coherent diffractive imaging microscope with a tabletop high harmonic EUV source
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Coherent diffractive imaging (CDI) using EUV/X-rays has proven to be a powerful microscopy method for imaging nanoscale objects. In traditional CDI, the oversampling condition limits its applicability to small, isolated objects. A new technique called keyhole CDI was demonstrated on a synchrotron X-ray source to circumvent this limitation. Here we demonstrate the first keyhole CDI result with a tabletop extreme ultraviolet (EUV) source. The EUV source is based on high harmonic generation (HHG), and our modified form of keyhole CDI uses a highly reflective curved EUV mirror instead of a lossy Fresnel zone plate, offering a ~10x increase in photon throughput of the imaging system, and a more uniform illumination on the sample. In addition, we have demonstrated a record 22 nm resolution using our tabletop CDI setup, and also the successful extension to reflection mode for a periodic sample. Combining these results with keyhole CDI will open the path to the realization of a compact EUV microscope for imaging general non-isolated and non-periodic samples, in both transmission and reflection mode.

Paper Details

Date Published: 18 April 2013
PDF: 7 pages
Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86810H (18 April 2013); doi: 10.1117/12.2011615
Show Author Affiliations
Bosheng Zhang, Univ. of Colorado at Boulder (United States)
Matthew D. Seaberg, Univ. of Colorado at Boulder (United States)
Daniel E. Adams, Univ. of Colorado at Boulder (United States)
Dennis F. Gardner, Univ. of Colorado at Boulder (United States)
Margaret M. Murnane, Univ. of Colorado at Boulder (United States)
Henry C. Kapteyn, Univ. of Colorado at Boulder (United States)


Published in SPIE Proceedings Vol. 8681:
Metrology, Inspection, and Process Control for Microlithography XXVII
Alexander Starikov; Jason P. Cain, Editor(s)

© SPIE. Terms of Use
Back to Top