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Proceedings Paper

Modeling the rate of morphology evolution during annealing of block copolymer thin films
Author(s): Jeffrey D Weinhold; Phillip D Hustad; Peter Trefonas
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Date Published:
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Proc. SPIE 8680, Alternative Lithographic Technologies V, 868008; doi: 10.1117/12.2011603
Show Author Affiliations
Jeffrey D Weinhold, Dow Chemical Co (United States)
Phillip D Hustad, Dow Chemical Co (United States)
Peter Trefonas, Dow Chemical Co (United States)


Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)

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