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Proceedings Paper

Design and simulation of illuminator with micro scanning slit array for NA 0.75 lithography system
Author(s): Linglin Zhu; Aijun Zeng; Shanhua Zhang; Ruifang Fang; Huijie Huang
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Paper Abstract

An illuminator with a micro scanning slit array for NA 0.75 lithography system has been proposed in this paper. In this illuminator, the beam is shaped by a diffractive optical element (DOE), a zoom and axicon lenses. The beam is homogenized by a micro intergrator rod array. The micro scanning slit array is used to substitute for the traditional internal rema. A micro lens array and a condenser image the micro scanning slit array onto the mask. This illuminator needs no illumination lens group and reduces the effect of the vibration introduced by the internal rema. The illuminator is designed and simulated. The result shows that the illuminating field on the mask has good uniformity and trapezoidal distribution along the scanning direction. The feasibility of the illuminator is verified.

Paper Details

Date Published: 12 April 2013
PDF: 7 pages
Proc. SPIE 8683, Optical Microlithography XXVI, 86832G (12 April 2013); doi: 10.1117/12.2011525
Show Author Affiliations
Linglin Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Aijun Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Shanhua Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Ruifang Fang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 8683:
Optical Microlithography XXVI
Will Conley, Editor(s)

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