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Proceedings Paper

Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning
Author(s): Souvik Chakrabarty; Christine Ouyang; Marie Krysak; Markos Trikeriotis; Kyoungyoung Cho; Emmanuel P. Giannelis; Christopher K. Ober
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Paper Abstract

DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions.

Paper Details

Date Published: 1 April 2013
PDF: 8 pages
Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867906 (1 April 2013); doi: 10.1117/12.2011490
Show Author Affiliations
Souvik Chakrabarty, Cornell Univ. (United States)
Christine Ouyang, Cornell Univ. (United States)
Marie Krysak, Cornell Univ. (United States)
Markos Trikeriotis, Cornell Univ. (United States)
Kyoungyoung Cho, SEMATECH Inc. (United States)
Emmanuel P. Giannelis, Cornell Univ. (United States)
Christopher K. Ober, Cornell Univ. (United States)

Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

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