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Proceedings Paper

Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method
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Paper Abstract

Directed self-assembly lithography (DSAL), which combines self-assembling materials and a lithographically defined prepattern, is a potential candidate to extend optical lithography beyond 22 nm. To take full advantage of DSAL requires diminishing not only systematic error modes but also random error modes by carefully designing a lithographically defined prepattern and precisely adjusting process conditions. To accomplish this with satisfactory accuracy, we have proposed a novel method to evaluate DSAL error modes based on simulations using dissipative particle dynamics (DPD). We have found that we can estimate not only systematic errors but also random errors qualitatively by simulations.

Paper Details

Date Published: 26 March 2013
PDF: 7 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 868015 (26 March 2013); doi: 10.1117/12.2011439
Show Author Affiliations
Katsuyoshi Kodera, Toshiba Corp. (Japan)
Shimon Maeda, Toshiba Corp. (Japan)
Satoshi Tanaka, Toshiba Corp. (Japan)
Shoji Mimotogi, Toshiba Corp. (Japan)
Yuriko Seino, Toshiba Corp. (Japan)
Hiroki Yonemitsu, Toshiba Corp. (Japan)
Hironobu Sato, Toshiba Corp. (Japan)
Tsukasa Azuma, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)

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