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Proceedings Paper

Polymer blends for directed self-assembly
Author(s): Yuuji Namie; Yusuke Anno; Takehiko Naruoka; Shinya Minegishi; Tomoki Nagai; Yoshi Hishiro; Yoshikazu Yamaguchi
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Paper Abstract

The advantage of blend DSA (Directed Self Assembly) is milder anneal condition than PS-b-PMMA BCP DSA materials and availability of conventional instruments. In this paper, blend type DSA was applied for hole patterning. Target patterns were contact hole and oval hole. Polymer phase separation behavior has been studied from the point of χN. In the case of polymer blend, χN needs to be more than 2 to give phase separation. At first the effect of polymer size was studied. When the polymer weight was low, the shrunk hole was not clean because of low χN. Furthermore, the correlation of shrink amount and χN was studied. Higher χN polymer blend system gave higher shrink amount. High χN polymer systems give clear interface, then the intermixing area would be reduced, then the attached polymer blend part became larger. The polymer blend ratio effect was also investigated. The blend ratio was varied for polymer A/ polymer B=70/30-50/50. The shrink amount of oval hole was reduced with increasing the ratio of polymer B. However, the shrink amount ratio of CDY/CDX was almost constant (~3).

Paper Details

Date Published: 26 March 2013
PDF: 5 pages
Proc. SPIE 8680, Alternative Lithographic Technologies V, 86801M (26 March 2013); doi: 10.1117/12.2011418
Show Author Affiliations
Yuuji Namie, JSR Corp. Yokkaichi Plant (Japan)
Yusuke Anno, JSR Micro. NV. Technologielaan (Belgium)
Takehiko Naruoka, JSR Micro, Inc. (United States)
Shinya Minegishi, JSR Corp. Yokkaichi Plant (Japan)
Tomoki Nagai, JSR Corp. Yokkaichi Plant (Japan)
Yoshi Hishiro, JSR Micro, Inc. (United States)
Yoshikazu Yamaguchi, JSR Corp. Yokkaichi Plant (Japan)

Published in SPIE Proceedings Vol. 8680:
Alternative Lithographic Technologies V
William M. Tong, Editor(s)

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