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Proceedings Paper

Preparation and properties of novel polymeric sulfonium photoacid generator
Author(s): Juan Liu; Liyuan Wang
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Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 86821W; doi: 10.1117/12.2011388
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Juan Liu, Beijing Normal Univ (China)
Liyuan Wang, Beijing Normal Univ (China)


Published in SPIE Proceedings Vol. 8682:
Advances in Resist Materials and Processing Technology XXX
Mark H. Somervell, Editor(s)

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