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Proceedings Paper

Advanced overlay stability control with correction per exposure on immersion scanners
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Paper Abstract

In this paper, we propose advanced overlay stability control improving conventional stability control, Baseliner™ and reference wafers with new vertical structure for effective stability control. We verify improved overlay stability control experimentally by using this stability control method. Also we suggest that additional improvements can be achieved by controllable process terms. For focus stability control, we make reference wafers which can measure overlay and focus simultaneously on the same wafer to minimize monitoring wafers.

Paper Details

Date Published: 10 April 2013
PDF: 6 pages
Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86811D (10 April 2013); doi: 10.1117/12.2011379
Show Author Affiliations
Jinkyu Han, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jinseok Heo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chan Hwang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jeongho Yeo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 8681:
Metrology, Inspection, and Process Control for Microlithography XXVII
Alexander Starikov; Jason P. Cain, Editor(s)

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