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Proceedings Paper

Ar and He plasma pretreatments of model organic masking materials for performance improvement during plasma pattern transfer
Author(s): Dominik Metzler; Florian Weilnboeck; Nick Fox-Lyon; Gottlieb S. Oehrlein; Sebastian Engelmann; Robert L. Bruce
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Proc. SPIE 8685, Advanced Etch Technology for Nanopatterning II, 868507; doi: 10.1117/12.2011343
Show Author Affiliations
Dominik Metzler, Univ. of Maryland (United States)
Florian Weilnboeck, Univ. of Maryland (United States)
Nick Fox-Lyon, Univ. of Maryland (United States)
Gottlieb S. Oehrlein, Univ. of Maryland (United States)
Sebastian Engelmann, IBM Thomas J Watson Research Ctr. (United States)
Robert L. Bruce, IBM Thomas J Watson Research Ctr. (United States)


Published in SPIE Proceedings Vol. 8685:
Advanced Etch Technology for Nanopatterning II
Ying Zhang; Gottlieb S. Oehrlein; Qinghuang Lin, Editor(s)

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