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Proceedings Paper

Chemically amplified resists for I-line and G-line applications
Author(s): Amanda K. Berry; Wayne E. Feely; Stephen D. Thompson; Gary S. Calabrese; Roger F. Sinta; Angelo A. Lamola; James W. Thackeray; George W. Orsula
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Paper Abstract

This paper describes the evaluation of several phenothiazine and benzophenothiazine derivatives which are useful as i-line and g-line photosensitizers for a class of chemically amplified crosslinked resists. Data supporting an electron transfer mechanism of sensitization from the excited state of the sensitizer to the acid generator are provided. Initial lithographic screening demonstrates the potential for both high sensitivity and submicron resolution in these systems.

Paper Details

Date Published: 1 June 1990
PDF: 10 pages
Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20113
Show Author Affiliations
Amanda K. Berry, Rohm and Haas Co. (United States)
Wayne E. Feely, Rohm and Haas Co. (United States)
Stephen D. Thompson, Rohm and Haas Co. (United States)
Gary S. Calabrese, Shipley Co., Inc. (United States)
Roger F. Sinta, Shipley Co., Inc. (United States)
Angelo A. Lamola, Shipley Co., Inc. (United States)
James W. Thackeray, Shipley Co., Inc. (United States)
George W. Orsula, Shipley Co., Inc. (United States)

Published in SPIE Proceedings Vol. 1262:
Advances in Resist Technology and Processing VII
Michael P. C. Watts, Editor(s)

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