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Proceedings Paper

A reverse design method for EUV lithography illumination system
Author(s): Qiuli Mei; Yanqiu Li; Fei Liu
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Paper Abstract

Few design method for Extreme Ultraviolet (EUV) lithography illumination system has been proposed in the past years. In this paper, we developed a design method for the illuminator with all the components in the system designed in a reverse sequence. Some key issues about the design of relay system and the configuration of the fly’s eye will be discussed in detail. An illuminator for numerical aperture 0.3 lithography has been designed with the method developed in this paper. Design result shows the slit uniformity of the scanning energy distribution can reach 1.2% under 90-degree dipole illumination, 45-degree quadrupole illumination and annular illumination.

Paper Details

Date Published: 1 April 2013
PDF: 13 pages
Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867923 (1 April 2013); doi: 10.1117/12.2011290
Show Author Affiliations
Qiuli Mei, Beijing Institute of Technology (China)
Yanqiu Li, Beijing Institute of Technology (China)
Fei Liu, Beijing Institute of Technology (China)


Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

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