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Proceedings Paper

Mask strategy and layout decomposition for self-aligned quadruple patterning
Author(s): Weiling Kang; Chen Feng; Yijian Chen
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Paper Abstract

Self-aligned quadruple patterning (SAQP) process is a proven technique for deep nano-scale IC manufacturing, while its mask design and layout decomposition strategy is less intuitive. In this paper, we examine both 2- and 3-mask SAQP process characteristics and develop various decomposition methods to achieve higher feature density and 2-D design flexibility. It is demonstrated that by generating assisting mandrels, SAQP layout decomposition can be degenerated into a SADP decomposition problem for which mature algorithms already exist in our EDA industry. Moreover, a spacer-expansion mask concept is introduced and a grouping/coloring algorithm to assign feature colors is developed for 3-mask SAQP layout decomposition. Finally, several 2-D layouts are successfully decomposed, showing the functionality of the decomposition method we proposed.

Paper Details

Date Published: 29 March 2013
PDF: 13 pages
Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, 86840E (29 March 2013); doi: 10.1117/12.2011261
Show Author Affiliations
Weiling Kang, Peking Univ. Shenzhen Graduate School (China)
Chen Feng, The Univ. of Michigan (United States)
Yijian Chen, Peking Univ. Shenzhen Graduate School (China)

Published in SPIE Proceedings Vol. 8684:
Design for Manufacturability through Design-Process Integration VII
Mark E. Mason; John L. Sturtevant, Editor(s)

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