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Proceedings Paper

An automated resource management system to improve production tapeout turn-around time
Author(s): Eric Guo; Qingwei Liu; Sherry Zhu; Jason Wu; Jenny Tsai; Junwei Lu; Mark C. Simmons
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Paper Abstract

In today’s semiconductor industry, both the pure-play and independent device manufacturer (IDM) foundries are constantly and rigorously competing for market share. The acknowledged benefit for customers who partner with these foundries includes a reduced cost-of-ownership, along with the underwritten agreement of meeting or exceeding an aggressive time-to-market schedule. Because the Semiconductor Manufacturing International Corporation (SMIC) is one of the world-wide forerunners in the foundry industry, one of its primary concerns is ensuring continual improvement in its fab’s turnaround time (TAT), especially given that newer technology nodes and their associated processes are increasing in complexity, and consequently, in their time-to-process. In assessing current runtime data trends at the 65nm and 40nm technology nodes, it was hypothesized that hardware and software utilization improvements could accomplish a reduced overall TAT. By running an experiment using the Mentor Graphics Calibre® Cluster Manager (CalCM) software, SMIC was able to demonstrate just over a 30% aggregate TAT improvement in conjunction with a greater than 90% average utilization of all hardware resources. This paper describes the experimental setup and procedures that predicated the reported results.

Paper Details

Date Published: 29 March 2013
PDF: 7 pages
Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, 86840P (29 March 2013); doi: 10.1117/12.2011231
Show Author Affiliations
Eric Guo, Semiconductor Manufacturing International Corp. (China)
Qingwei Liu, Semiconductor Manufacturing International Corp. (China)
Sherry Zhu, Semiconductor Manufacturing International Corp. (China)
Jason Wu, Semiconductor Manufacturing International Corp. (China)
Jenny Tsai, Mentor Graphics Corp. (United States)
Junwei Lu, Mentor Graphics Corp. (China)
Mark C. Simmons, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 8684:
Design for Manufacturability through Design-Process Integration VII
Mark E. Mason; John L. Sturtevant, Editor(s)

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