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Proceedings Paper

CO2/Sn LPP EUV sources for device development and HVM
Author(s): David C. Brandt; Igor V. Fomenkov; Nigel R. Farrar; Bruno La Fontaine; David W. Myers; Daniel J. Brown; Alex I. Ershov; Richard L. Sandstrom; Georgiy O. Vaschenko; Norbert R. Böwering; Palash Das; Vladimir B. Fleurov; Kevin Zhang; Shailendra N. Srivastava; Imtiaz Ahmad; Chirag Rajyaguru; Silvia De Dea; Wayne J. Dunstan; Peter Baumgart; Toshi Ishihara; Rod D. Simmons; Robert N. Jacques; Robert A. Bergstedt; Peter I. Porshnev; Christopher J. Wittak; Robert J. Rafac; Jonathan Grava; Alexander A. Schafgans; Yezheng Tao; Kay Hoffmann; Tedsuja Ishikawa; David R. Evans; Spencer D. Rich
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Paper Abstract

Laser produced plasma (LPP) systems have been developed as the primary approach for use in EUV scanner light sources for optical imaging of circuit features at 20nm nodes and beyond. This paper provides a review of development progress and productization status for LPP extreme-ultra-violet (EUV) sources with performance goals targeted to meet specific requirements from ASML. We present the latest results on power generation and collector protection for sources in the field operating at 10W nominal power and in San Diego operating in MOPA (Master Oscillator Power Amplifier) Prepulse mode at higher powers. Semiconductor industry standards for reliability and source availability data are provided. In these proceedings we show results demonstrating validation of MOPA Prepulse operation at high dose-controlled power: 40 W average power with closed-loop active dose control meeting the requirement for dose stability, 55 W average power with closed-loop active dose control, and early collector protection tests to 4 billion pulses without loss of reflectivity.

Paper Details

Date Published: 1 April 2013
PDF: 8 pages
Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86791G (1 April 2013); doi: 10.1117/12.2011212
Show Author Affiliations
David C. Brandt, Cymer, Inc. (United States)
Igor V. Fomenkov, Cymer, Inc. (United States)
Nigel R. Farrar, Cymer, Inc. (United States)
Bruno La Fontaine, Cymer, Inc. (United States)
David W. Myers, Cymer, Inc. (United States)
Daniel J. Brown, Cymer, Inc. (United States)
Alex I. Ershov, Cymer, Inc. (United States)
Richard L. Sandstrom, Cymer, Inc. (United States)
Georgiy O. Vaschenko, Cymer, Inc. (United States)
Norbert R. Böwering, Cymer, Inc. (United States)
Palash Das, Cymer, Inc. (United States)
Vladimir B. Fleurov, Cymer, Inc. (United States)
Kevin Zhang, Cymer, Inc. (United States)
Shailendra N. Srivastava, Cymer, Inc. (United States)
Imtiaz Ahmad, Cymer, Inc. (United States)
Chirag Rajyaguru, Cymer, Inc. (United States)
Silvia De Dea, Cymer, Inc. (United States)
Wayne J. Dunstan, Cymer, Inc. (United States)
Peter Baumgart, Cymer, Inc. (United States)
Toshi Ishihara, Cymer, Inc. (United States)
Rod D. Simmons, Cymer, Inc. (United States)
Robert N. Jacques, Cymer, Inc. (United States)
Robert A. Bergstedt, Cymer, Inc. (United States)
Peter I. Porshnev, Cymer, Inc. (United States)
Christopher J. Wittak, Cymer, Inc. (United States)
Robert J. Rafac, Cymer, Inc. (United States)
Jonathan Grava, Cymer, Inc. (United States)
Alexander A. Schafgans, Cymer, Inc. (United States)
Yezheng Tao, Cymer, Inc. (United States)
Kay Hoffmann, Cymer, Inc. (United States)
Tedsuja Ishikawa, Cymer, Inc. (United States)
David R. Evans, Cymer, Inc. (United States)
Spencer D. Rich, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

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