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Proceedings Paper

Probing limits of acoustic nanometrology using coherent extreme ultraviolet light
Author(s): Damiano Nardi; Kathleen M. Hoogeboom-Pot; Jorge N. Hernandez-Charpak; Marie Tripp; Sean W. King; Erik H. Anderson; Margaret M. Murnane; Henry C. Kapteyn
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Paper Abstract

Photoacoustic nanometrology using coherent extreme ultraviolet (EUV) light detection is a unique and powerful tool for probing ultrathin films with a wide range of mechanical properties and thicknesses well under 100 nm. In this technique, short wavelength acoustic waves are generated through laser excitation of a nano-patterned metallic grating, and then probed by diffracting coherent EUV beams from the dynamic surface deformation. Both longitudinal and surface acoustic waves within thin films and metallic nanostructures can be observed using EUV light as a phase-sensitive probe. The use of nanostructured metal transducers enables the generation of particularly short wavelength surface acoustic waves, which truly confine the measurement within the ultrathin film layer of interest, to thicknesses < 50 nm for the first time. Simultaneous measurement of longitudinal and transverse surface wave velocities yields both the Young’s modulus and Poisson’s ratio of the film. In the future, this approach will make possible precise mechanical characterization of nanostructured systems at sub-10 nm length scales.

Paper Details

Date Published: 10 April 2013
PDF: 8 pages
Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86810N (10 April 2013); doi: 10.1117/12.2011194
Show Author Affiliations
Damiano Nardi, JILA (United States)
Kathleen M. Hoogeboom-Pot, JILA (United States)
Jorge N. Hernandez-Charpak, JILA (United States)
Marie Tripp, Intel Corp. (United States)
Sean W. King, Intel Corp. (United States)
Erik H. Anderson, Lawrence Berkeley National Lab. (United States)
Margaret M. Murnane, JILA (United States)
Henry C. Kapteyn, JILA (United States)

Published in SPIE Proceedings Vol. 8681:
Metrology, Inspection, and Process Control for Microlithography XXVII
Alexander Starikov; Jason P. Cain, Editor(s)

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