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Proceedings Paper

Photoresist aerosol particle formation during spin coating
Author(s): L. David Pratt
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Paper Abstract

Aerosol photoresist particles, that formed during spin-coating of silicon wafers, were contained by modifying the spin-cup of a photorésist coater. The aerosol particles were counted, using an optical particle counter, and collected for SEM inspection with a cascade particle inipactor. We measured the effect spin-coating process variables had on the nuniber, size and shape of photoresist aerosol particles. Both negative and positive photoresist coatings, having photoresist aerosol particles on their surfaces, were exposed and developed to demonstrate the type of pattern defects that fornied.

Paper Details

Date Published: 1 June 1990
PDF: 10 pages
Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20111
Show Author Affiliations
L. David Pratt, Olin Hunt Specialty Products Inc. (United States)

Published in SPIE Proceedings Vol. 1262:
Advances in Resist Technology and Processing VII
Michael P. C. Watts, Editor(s)

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