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Proceedings Paper

Multiple-step process window aware OPC for hyper-NA lithography
Author(s): C. T. Hsuan; C. M. Hu; Fred Lo; Elvis Yang; T. H. Yang; K. C. Chen; Chih-Yuan Lu
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Paper Abstract

To avoid the dramatically diminishing of lithography process window as the shrink of design rule, the implementation of process-aware optical proximity correction (PWOPC) has been indispensable. The conventional PWOPC is capable of reducing CD variation at off-focus-off-dose conditions for the worst hotspot but some new weak points might be generated due to over compensation from compromising with the worst hotspot. In this paper, a so-called “multiple-step process aware OPC”, was demonstrated for maintaining better process window for all hotspots via damascene metal layer in 43nm half-pitch design. Through isolating the hotspots from the chip layout, different CD tolerances can be applied for the various types of hotspots to avoid the conflicts between different requirements. Increased levels of CD-tolerance could be applied in the multiple-step PWOPC flow for the layout with a great number of weak points. The ultimate aim of the multiple-step PWOPC operation is maintaining sufficient process window for entire layout. The performance comparison was carried out among nominal OPC, conventional PWOPC and multiple-step PWOPC flows for contour CD within appropriate process window, turn around time of layout correction and CD distribution of hotspots.

Paper Details

Date Published: 12 April 2013
PDF: 10 pages
Proc. SPIE 8683, Optical Microlithography XXVI, 868323 (12 April 2013); doi: 10.1117/12.2011061
Show Author Affiliations
C. T. Hsuan, Macronix International Co., Ltd. (Taiwan)
C. M. Hu, Macronix International Co., Ltd. (Taiwan)
Fred Lo, Macronix International Co., Ltd. (Taiwan)
Elvis Yang, Macronix International Co., Ltd. (Taiwan)
T. H. Yang, Macronix International Co., Ltd. (Taiwan)
K. C. Chen, Macronix International Co., Ltd. (Taiwan)
Chih-Yuan Lu, Macronix International Co., Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 8683:
Optical Microlithography XXVI
Will Conley, Editor(s)

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