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Proceedings Paper

Application of the in-situ dyeing effect for an image reversal resist
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Paper Abstract

The dyeing effect observed at an image reversal resist, are explained using tTh-Vis spectropbotanetry , and on that basis, the canputations of A , B, C and y values used in SAMPLE simulations prove the lithographic properties of this technique.

Paper Details

Date Published: 1 June 1990
PDF: 6 pages
Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20110
Show Author Affiliations
Dan V. Nicolau, ICCE/CCSIT-CE Bucharest (Australia)
Mircea V. Dusa, ICCE/CCSIT-CE Bucharest (United States)


Published in SPIE Proceedings Vol. 1262:
Advances in Resist Technology and Processing VII
Michael P. C. Watts, Editor(s)

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