Share Email Print

Proceedings Paper

Application of the in-situ dyeing effect for an image reversal resist
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The dyeing effect observed at an image reversal resist, are explained using tTh-Vis spectropbotanetry , and on that basis, the canputations of A , B, C and y values used in SAMPLE simulations prove the lithographic properties of this technique.

Paper Details

Date Published: 1 June 1990
PDF: 6 pages
Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20110
Show Author Affiliations
Dan V. Nicolau, ICCE/CCSIT-CE Bucharest (Australia)
Mircea V. Dusa, ICCE/CCSIT-CE Bucharest (United States)

Published in SPIE Proceedings Vol. 1262:
Advances in Resist Technology and Processing VII
Michael P. C. Watts, Editor(s)

© SPIE. Terms of Use
Back to Top