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Proceedings Paper

Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL
Author(s): Masatoshi Echigo; Masako Yamakawa; Yumi Ochiai; Yu Okada; Takashi Makinoshima; Masaaki Takasuka
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Paper Abstract

In this paper, we report the development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL. The new xanthendiol derivatives were easily synthesized by the condensation of aldehydes and dihydroxyaromatic compounds. We found 13-biphenyl-13H-benzoxanthen-3,10-diol was showed the good applicability to the raw material for the resist for EB/EUVL. The EB patterning result showed the resist containing xanthendiol derivative could resolve the 30 nm half-pitch pattern. Furthermore sub 30 nm half-pitch patterns were partially resolved.

Paper Details

Date Published: 29 March 2013
PDF: 8 pages
Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 86821V (29 March 2013); doi: 10.1117/12.2010926
Show Author Affiliations
Masatoshi Echigo, Mitsubishi Gas Chemical Co., Inc. (Japan)
Masako Yamakawa, Mitsubishi Gas Chemical Co., Inc. (Japan)
Yumi Ochiai, Mitsubishi Gas Chemical Co., Inc. (Japan)
Yu Okada, Mitsubishi Gas Chemical Co., Inc. (Japan)
Takashi Makinoshima, Mitsubishi Gas Chemical Co., Inc. (Japan)
Masaaki Takasuka, Mitsubishi Gas Chemical Co., Inc. (Japan)


Published in SPIE Proceedings Vol. 8682:
Advances in Resist Materials and Processing Technology XXX
Mark H. Somervell, Editor(s)

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