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Proceedings Paper

Comprehensive thermal aberration and distortion control of lithographic lenses for accurate overlay
Author(s): Yohei Fujishima; Satoshi Ishiyama; Susumu Isago; Akihiro Fukui; Hajime Yamamoto; Toru Hirayama; Tomoyuki Matsuyama; Yasuhiro Ohmura
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Paper Abstract

Accurate overlay with high throughput is the key to success in multiple-patterning lithography. To achieve accurate overlay, the imaging system must control and minimize the thermal aberration and distortion. There are several sources of thermal aberration in an immersion lithography system: (1) reticle deformation by reticle heating; (2) air temperature fluctuation near the reticle; (3) thermal aberrations from the projection lens; and (4) immersion water temperature fluctuation. All aberrations and distortion are impacted by these sources and need to be minimized for accurate overlay. In this paper, we introduce our approach and technologies for the control of thermal aberrations.

Paper Details

Date Published: 12 April 2013
PDF: 7 pages
Proc. SPIE 8683, Optical Microlithography XXVI, 86831I (12 April 2013); doi: 10.1117/12.2010908
Show Author Affiliations
Yohei Fujishima, Nikon Corp. (Japan)
Satoshi Ishiyama, Nikon Corp. (Japan)
Susumu Isago, Nikon Corp. (Japan)
Akihiro Fukui, Nikon Corp. (Japan)
Hajime Yamamoto, Nikon Corp. (Japan)
Toru Hirayama, Nikon Corp. (Japan)
Tomoyuki Matsuyama, Nikon Corp. (Japan)
Yasuhiro Ohmura, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 8683:
Optical Microlithography XXVI
Will Conley, Editor(s)

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