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Proceedings Paper

Microlithography using conducting polymers
Author(s): Joachim Bargon; Theo Weidenbrueck; Takumi Ueno
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Paper Abstract

Lithographically structured electrically conducting polymers can be otained via photoexposure of precomposites, consisting of a matrix polymer and a photosensitive oxidant. Upon the selective destruction of the oxidant, the remaining oxidant can be used to convert a suitable monomer from its vapor phase into a lithographically patterned, electrically conducting polymer. This two-dimensional pattern can be converted into a three-dimensional pattern either via selective RIE or via electroplating a metal or other conducting material on top of the above composite. In a typical example the matrix polymer is PVC, pyrrole saves as the monomer, FeC13 as the photosensitive oxidant and copper is being electroplated onto the polypyrrole pattern.

Paper Details

Date Published: 1 June 1990
PDF: 5 pages
Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); doi: 10.1117/12.20109
Show Author Affiliations
Joachim Bargon, Univ. of Bonn (Germany)
Theo Weidenbrueck, Univ. of Bonn (Germany)
Takumi Ueno, Hitachi, Ltd. (Japan)

Published in SPIE Proceedings Vol. 1262:
Advances in Resist Technology and Processing VII
Michael P. C. Watts, Editor(s)

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